| Popis: |
In this work, discussing the detection of NH 4 + ion based on LAPS with functionalized 2 nm-thick ALD-HfO 2 film using RTA and CF 4 plasma is demonstrated. The annealing treatment at 500, 700, and 900°C were performed on ALD-HfO 2 film and the plasma treatment for 1, 3, and 5 min were performed on ALD-HfO 2 film with 900°C annealing. In the results, the response for NH 4 + ion detection was decreased with increasing annealing temperature and increased with increasing plasma time. The optimum sensitivity of 37.28mV/pNH 4 was achieved with 900°C annealing and 5 min CF 4 plasma. |
