Organotin bearing polymeric resists for electron beam lithography

Autor:	Midathala Yogesh, Mohamad G. Moinuddin, Lalit D. Khillare, Srinivas Chinthalapalli, Satinder K. Sharma, Subrata Ghosh, Kenneth E. Gonsalves
Rok vydání:	2022
Předmět:	Electrical and Electronic Engineering Condensed Matter Physics Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials
Zdroj:	Microelectronic Engineering. 260:111795
ISSN:	0167-9317
DOI:	10.1016/j.mee.2022.111795
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::f679ee3a0e7a3988ad41f1f505ff47dc https://doi.org/10.1016/j.mee.2022.111795 Zobrazit plný text záznamu Full Text from ScienceDirect