H-TALIF measurement for wall radical quenching modelling in microscale combustion
| Autor: | Yong Fan, Yu Saiki, Yuji Suzuki, Sangeeth Sanal |
|---|---|
| Rok vydání: | 2018 |
| Předmět: |
Quenching
Premixed flame History Sticking coefficient Materials science 020209 energy Analytical chemistry 02 engineering and technology Hydrogen atom Combustion Methane Computer Science Applications Education chemistry.chemical_compound Adsorption 020401 chemical engineering chemistry 0202 electrical engineering electronic engineering information engineering 0204 chemical engineering Absorption (chemistry) |
| Zdroj: | Journal of Physics: Conference Series. 1052:012040 |
| ISSN: | 1742-6596 1742-6588 |
| Popis: | Two-dimensional hydrogen atom (H) distribution in a CH4/air premixed flame in a narrow channel was measured using a newly-developed two-photon absorption LIF (TALIF) setup with high efficiency 205 nm laser. The wall chemical effect of SUS321 and quartz surfaces on the H distribution in a methane flame was examined. Based on the measured H atom concentration near the wall, a radical quenching model focused on the H adsorption is proposed and the initial sticking coefficient (S 0) of H on SUS321 and quartz surfaces are estimated as 0.1 and 0.01, respectively. Sensitivity analysis of CO, HRR and species distributions with varying S 0 of H, O, OH, CH3 were performed. It is found that the H adsorption should be dominant in the wall chemical effect on the methane flame. |
| Databáze: | OpenAIRE |
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