Copper Resistivity in Electrodeposited Dual Damascene Interconnects - An Integrated Circuit Perspective
| Autor: | Naftali Lustig, Brett Baker-ONeal, Philip Flaitz, Theodorus Standaert, Patrick DeHaven, Andrew Simon, Tze-Man Ko, Stephan Grunow, James Werking, Stephan Greco, Sujatha Sankaran, Hariklia (Lili) Deligianni, Daniel Edelstein |
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| Rok vydání: | 2006 |
| Zdroj: | ECS Meeting Abstracts. :411-411 |
| ISSN: | 2151-2043 |
| DOI: | 10.1149/ma2006-01/10/411 |
| Popis: | not Available. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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