Stress Compensation in Fluoride Coatings for the VUV Spectral Range

Autor:	Stefan Günster, Henrik Ehlers, Manfred Dieckmann, Detlev Ristau
Rok vydání:	2007
Předmět:	Materials science Silicon Analytical chemistry chemistry.chemical_element Stress (mechanics) chemistry.chemical_compound chemistry Stack (abstract data type) Physical vapor deposition Ultimate tensile strength Thin film Composite material Silicon oxide Fluoride
Zdroj:	Optical Interference Coatings.
Popis:	Fluoride materials deposited with conventional thermal evaporation techniques show a high tensile stress. The effect of stress compensation by inserting compressive silicon oxide layers into the tensile fluoride stack is investigated.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::f620962fb0ffa06d2e62928c62e6be21 https://doi.org/10.1364/oic.2007.tub5 Zobrazit plný text záznamu