A very-low RF noise and high-performance (4.8 fJ) bipolar device in a 0.35 μm high-density BiCMOS SRAM technology
Autor: | N. Camilleri, F.B. Shapiro, J.-H. Lin, R.C. Taft, D.E. Bockelman |
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Rok vydání: | 2002 |
Předmět: | |
Zdroj: | Proceedings of 1994 VLSI Technology Symposium. |
Popis: | This paper presented the bipolar RF and circuit characterization of a high-performance 0.35 /spl mu/m BICMOS technology specifically designed for fast SRAMs. A 900 MHz noise figure as low as 0.54 dB at 0.5 mA, prescaler operation up to 3.3 GHz for a switch current of 200 pA, and unstacked CML operation down to 1.0 V yielding a 4.8 fJ power-delay product were reported. > |
Databáze: | OpenAIRE |
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