Thermalization of the flow of sputtered target atoms during ion-plasma deposition of films

Autor:	Andrey Y. Komlev, R. A. Platonov, V. A. Volpyas, Andrey Kozyrev
Rok vydání:	2014
Předmět:	Physics Condensed Matter::Materials Science Thermalisation Physics::Plasma Physics Cavity magnetron Flow (psychology) General Physics and Astronomy Deposition (phase transition) Subatomic particle Sputter deposition Atomic physics Diffusion (business) Ion
Zdroj:	Physics Letters A. 378:3182-3184
ISSN:	0375-9601
Popis:	The boundary of the zone in which sputtered atoms are thermalized in the substrate–target drift space during the ion-plasma magnetron deposition of films is determined theoretically and experimentally. A comparison of the thicknesses of films deposited on the front and back sides of substrates situated at different distances from the target makes it possible to divide the flow of atoms sputtered toward substrates into direct and diffusion flows and to determine the dimensions of the spatial zone in which sputtered atoms are thermalized. The experimental data are in quantitative agreement with the results of a statistical simulation of the thermalization process of atomic particles during the ion-plasma deposition. This simulation enables optimization of the technology of defect-free growth of films with uniform thickness on substrates with complex 3D configuration.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::f6176135d04cb2ac6f86395c50dfa2f3 https://doi.org/10.1016/j.physleta.2014.09.014 Zobrazit plný text záznamu Full Text from ScienceDirect