Next generation lithography—the real challenge

Autor: Karen H. Brown
Rok vydání: 1998
Předmět:
Zdroj: The 1998 international conference on characterization and metrology for ULSI technology.
Popis: The semiconductor industry continues to move forward aggressively to make more productive wafers and lower cost per function in its products. The National Technology Roadmap for Semiconductors (NTRS) follows Moore’s Law of four times the number of bits per semiconductor memory chip every three years. Additionally, this productivity will be based to a large degree on the continued ability to decrease the minimum feature size year by year. In the past three years the industry has actually accelerated the introduction of small feature sizes.
Databáze: OpenAIRE