Etching characteristics and modeling for oval-shaped contact
| Autor: | Gyung-jin Min, Seok-Hyun Lim, Chul-Ho Shin, Sung-Chan Park, Chang-Jin Kang, Han-Ku Cho, Joo-Tae Moon |
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| Rok vydání: | 2007 |
| Předmět: |
Long axis
Materials science Short axis Bowing Metals and Alloys Surfaces and Interfaces Engraving Surfaces Coatings and Films Electronic Optical and Magnetic Materials Ion Cross section (physics) Reflection (mathematics) stomatognathic system Etching (microfabrication) visual_art Materials Chemistry visual_art.visual_art_medium Forensic engineering Composite material |
| Zdroj: | Thin Solid Films. 515:4923-4927 |
| ISSN: | 0040-6090 |
| Popis: | In this study, etching characteristics of oval-shaped contact were investigated. The oval-shaped contact showed different etching characteristics compared to the circular contact. The long axis cross-section of oval-shaped contact showed a more vertical profile and a less bowing compared to the short axis. To explain these phenomena, we simulated ion reflection from sloped oval-shaped hard-mask. From the simulation, we found that the ions reflected from hard-mask accumulated more toward short axis sidewall first. This ion accumulation and asymmetric charging explained the reason behind larger bowing and slopped profile phenomena of short axis. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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