Anti-Reflection Properties of Black Silicon Coated with Thin Films of Metal Oxides by Atomic Layer Deposition

Autor:	V. R. Shayapov, M. Yu. Afonin, M. V. Katkov, M. S. Lebedev, A. V. Aghabekyan, I. V. Yushina, D. E. Petukhova, G. Y. Ayvazyan, E. A. Maksimovskii
Rok vydání:	2021
Předmět:	Materials science Black silicon General Physics and Astronomy engineering.material Metal chemistry.chemical_compound Atomic layer deposition Reflection (mathematics) chemistry Coating Chemical engineering visual_art visual_art.visual_art_medium engineering Thin film
Zdroj:	Journal of Contemporary Physics (Armenian Academy of Sciences). 56:240-246
ISSN:	1934-9378 1068-3372
Popis:	The results of experimental studies of the anti-reflection properties of black silicon (b-Si) layers coated with thin films of TiO2, HfO2, and Sc2O3 metal oxides by atomic layer deposition (ALD) are presented. An improvement in the antireflection properties of b-Si in a wide spectral range is shown. It is expedient to use the investigated ALD films in solar cells as an effective passivating coating of the b-Si surface.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::f589a905ec88c85391addf8c63662694 https://doi.org/10.3103/s1068337221030075 Zobrazit plný text záznamu Full text from SpringerLink