Effects of helium ion irradiation on fluorinated plasma polymers
| Autor: | Wido H. Schreiner, Steven F. Durrant, Celso U. Davanzo, Bruno B. Lopes |
|---|---|
| Rok vydání: | 2010 |
| Předmět: |
Materials science
Absorption spectroscopy Analytical chemistry chemistry.chemical_element Surfaces and Interfaces General Chemistry Condensed Matter Physics Surfaces Coatings and Films Amorphous solid Ion implantation chemistry X-ray photoelectron spectroscopy Plasma-enhanced chemical vapor deposition Materials Chemistry Fluorine Irradiation Thin film |
| Zdroj: | Surface and Coatings Technology. 204:3059-3063 |
| ISSN: | 0257-8972 |
| DOI: | 10.1016/j.surfcoat.2010.02.016 |
| Popis: | The effects of ion irradiation on fluorinated plasma polymer films are investigated using profilometry, surface contact-angle measurements, infrared reflection absorption spectroscopy (IRRAS) and X-ray photoelectron spectroscopy (XPS). Remarkably, helium plasma immersion ion implantation (PIII) of several amorphous hydrogenated fluorinated plasma polymers deposited from C 2 H 2 –SF 6 , C 6 H 6 –SF 6 or C 6 F 6 produces film compactions of up to 40%, and modifies the surface energy in the 35 to 65 dyn cm –1 range. As revealed by IRRAS and XPS, the films contain C–H, C–C, C=C, C=O, O–H and C–F groups. XPS spectra confirm the presence of N (typically ∼ 5%). The films produced from SF 6 -containing plasmas also contain S. For irradiation times of 80 min, the film carbon content is increased, and the fluorine content is greatly reduced, by factors of about 3 to 15, depending on the initial film composition. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full Text from ScienceDirect