A Study on the Thermal Budget of Ferroelectric TiN/Hf0.5Zr0.5O2/TiN Capacitors for Next-Generation Memory Applications

Autor:	Hye Ryeon Park, Jeong Gyu Yoo, Jong Mook Kang, Min Kwan Cho, Taeho Gong, Seongbin Park, Seungbin Lee, Jin-HYun Kim, Seojun Lee, Rino Choi, Harrison Sejoon Kim, Yong Chan Jung, Jiyoung Kim, Si Joon Kim
Rok vydání:	2023
Zdroj:	2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM).
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::f4d526f9ecae4befa09c59a1dc5c6a69 https://doi.org/10.1109/edtm55494.2023.10103015 Zobrazit plný text záznamu