Improvement of Post-Exposure Delay Stability in Alicyclic ArF Excimer Photoresists

Autor: Shintaro Yamada, Sungseo Cho, C. Grant Willson, Timo Rager, Bénédicte Mortini, Severine Gally, Mikio Yamachika, Patrick Jean Paniez, Pierre-Olivier Sassoulas, Jeffrey D. Byers, Kyle Patterson
Rok vydání: 1999
Předmět:
Zdroj: Journal of Photopolymer Science and Technology. 12:553-560
ISSN: 1349-6336
0914-9244
Popis: This paper reports work toward designing environmentally stable alicyclic polymer-based photoresists for ArF excimer laser lithography. A design concept for improving post-exposure delay stability is suggested in this paper. The polymers described here were prepared from dinorbornene derivatives and maleic anhydride by free radical polymerization. The relationship among polymer structure, glass transition temperature (Tg) and post-exposure delay stability was studied. This new polymer design offers a pathway towards good post-exposure delay stability while maintaining high resolution.
Databáze: OpenAIRE