Improvement of Post-Exposure Delay Stability in Alicyclic ArF Excimer Photoresists
| Autor: | Shintaro Yamada, Sungseo Cho, C. Grant Willson, Timo Rager, Bénédicte Mortini, Severine Gally, Mikio Yamachika, Patrick Jean Paniez, Pierre-Olivier Sassoulas, Jeffrey D. Byers, Kyle Patterson |
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| Rok vydání: | 1999 |
| Předmět: |
chemistry.chemical_classification
Materials science Polymers and Plastics Excimer laser medicine.medical_treatment Organic Chemistry Radical polymerization Maleic anhydride Polymer Excimer Alicyclic compound chemistry.chemical_compound Chemical engineering chemistry Polymer chemistry Materials Chemistry medicine Glass transition Lithography |
| Zdroj: | Journal of Photopolymer Science and Technology. 12:553-560 |
| ISSN: | 1349-6336 0914-9244 |
| Popis: | This paper reports work toward designing environmentally stable alicyclic polymer-based photoresists for ArF excimer laser lithography. A design concept for improving post-exposure delay stability is suggested in this paper. The polymers described here were prepared from dinorbornene derivatives and maleic anhydride by free radical polymerization. The relationship among polymer structure, glass transition temperature (Tg) and post-exposure delay stability was studied. This new polymer design offers a pathway towards good post-exposure delay stability while maintaining high resolution. |
| Databáze: | OpenAIRE |
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