Interaction Force Analysis of Resist Film Surface in Water Vapor

Autor:	Akira Kawai, Takayoshi Niiyama
Rok vydání:	2004
Předmět:	Surface (mathematics) Force analysis Derjaguin approximation Materials science Polymers and Plastics Resist Atomic force microscopy Hamaker constant Organic Chemistry Materials Chemistry Nanotechnology Composite material Water vapor
Zdroj:	Journal of Photopolymer Science and Technology. 17:453-456
ISSN:	1349-6336 0914-9244
DOI:	10.2494/photopolymer.17.453
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::f3752b05bc75d43a768e5573febd13da https://doi.org/10.2494/photopolymer.17.453 Zobrazit plný text záznamu