Enhanced Remnant Polarization (30 μC/cm2) and Retention of Ferroelectric Hf0.5Zr0.5O2 by NH3 Plasma Treatment

Autor:	Peng Yuan, Boping Wang, Yang Yang, Shuxian Lv, Yuan Wang, Yannan Xu, Pengfei Jiang, Yuting Chen, Zhiwei Dang, Yaxin Ding, Tiancheng Gong, Qing Luo
Rok vydání:	2022
Předmět:	Electrical and Electronic Engineering Electronic Optical and Magnetic Materials
Zdroj:	IEEE Electron Device Letters. 43:1045-1048
ISSN:	1558-0563 0741-3106
DOI:	10.1109/led.2022.3178867
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::f31a408aaecd4f8250bbbdc03796d0aa https://doi.org/10.1109/led.2022.3178867 Zobrazit plný text záznamu