Chemical vapor deposition of ZrN using in situ produced ZrCl4 as a precursor
| Autor: | Mario Lessiak, Roland Haubner, Elisabeth Rauchenwald, Ronald Weissenbacher |
|---|---|
| Rok vydání: | 2019 |
| Předmět: |
Materials science
Morphology (linguistics) chemistry.chemical_element 02 engineering and technology Crystal structure Chemical vapor deposition engineering.material 01 natural sciences law.invention Metal Coating Optical microscope law 0103 physical sciences Materials Chemistry Deposition (phase transition) 010302 applied physics Zirconium Process Chemistry and Technology 021001 nanoscience & nanotechnology Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry Chemical engineering visual_art Ceramics and Composites engineering visual_art.visual_art_medium 0210 nano-technology |
| Zdroj: | Ceramics International. 45:9410-9414 |
| ISSN: | 0272-8842 |
| Popis: | ZrN is considered a promising material for high performance coatings of various tools, due to its outstanding mechanical properties. To generate ZrN layers, ZrCl 4 , a precursor, is effortlessly produced by the reaction of metallic Zirconium with HCl under elevated temperature, utilizing H 2 as a carrier gas. In a subsequent CVD (Chemical Vapor Deposition) reactor the ZrCl 4 reacts with NH 3 , forming ZrN coatings. By varying the experimental conditions, such as the H 2 and NH 3 gas flow, as well as addition of N 2 to the reaction gas, the influence on coating thickness, surface morphology and crystal structure of the generated coatings was investigated. Furthermore, the effects of various deposition temperatures in addition to positional differences of the hardmetal samples in the coating reactor were explored. Ultimately, the generated samples were analyzed by evaluation of coating thickness, light optical microscopy as well as SEM, EDX and XRD measurements. |
| Databáze: | OpenAIRE |
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