Incorporation of sodium into silicon dioxide film fabricated in glow discharge plasma

Autor:	I. M. Pronina, A. I. Vasil’eva, A. A. Aushev, V. M. Izgorodin, V. L. Yur’ev, V. G. Gogolev
Rok vydání:	2007
Předmět:	Fabrication Chemistry Silicon dioxide Sodium technology industry and agriculture Analytical chemistry chemistry.chemical_element Substrate (electronics) Plasma Decomposition chemistry.chemical_compound Chemical engineering Degradation (geology) Physical and Theoretical Chemistry Deposition (law)
Zdroj:	High Energy Chemistry. 41:451-453
ISSN:	1608-3148 0018-1439
DOI:	10.1134/s0018143907060112
Popis:	Results of experiments on the plasma-assisted fabrication of a silicon dioxide film with incorporated sodium are reported. The film was obtained via the decomposition of vaporized tetraethoxysilane and sodium compounds in a glow-discharge plasma and the deposition of the degradation products on a substrate. It is shown that this procedure makes it possible to incorporate up to 7 wt % sodium in the film composition.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::f22f9baa406dc02e9f0494385e7d158d https://doi.org/10.1134/s0018143907060112 Zobrazit plný text záznamu Plný text ve formátu PDF