Nitrogen Radio Frequency Plasma Processing of Fullerenes
Autor: | and Houjin Huang, Takeshi Akasaka, Masafumi Ata |
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Rok vydání: | 2004 |
Předmět: | |
Zdroj: | The Journal of Physical Chemistry B. 108:4640-4646 |
ISSN: | 1520-5207 1520-6106 |
DOI: | 10.1021/jp035985w |
Popis: | Nitrogen radio frequency (rf) plasma processing of C60 in the formation of the nitrogen endohedral complex (N@C60) and C60N adducts was fully examined with spectroscopic methodology and molecular orbital calculations. N@C60 formation was achieved using an internal parallel plate electrode type of capacitively coupled nitrogen rf plasma,1 whereas this was impossible when using an external ring electrode type of capacitively coupled rf nitrogen plasma. This experimental observation suggests that the formation of N@C60 in the internal parallel plate plasma system stems from the steep charge gradient around the rf cathode electrode induced by the self-bias effect, which promotes accelerated collisions of N+ with C60. Another important nitrogen rf plasma-induced process is the formation of C60N adducts. The formation and relative stabilities of internal and external C60N adducts and N@C60 were fully examined with the aid of MO calculations at a semiempirical approximation level, and the calculation was further... |
Databáze: | OpenAIRE |
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