Polymeric aperture masks for high performance organic integrated circuits
| Autor: | Steven D. Theiss, Dawn V. Muyres, Tommie W. Kelley, Paul F. Baude, Michael A. Haase, Patrick R. Fleming |
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| Rok vydání: | 2004 |
| Předmět: |
chemistry.chemical_classification
Materials science Laser ablation business.industry Aperture Surfaces and Interfaces Polymer Integrated circuit Condensed Matter Physics Surfaces Coatings and Films law.invention Organic semiconductor Pentacene chemistry.chemical_compound Mask set chemistry Thin-film transistor law Optoelectronics business |
| Zdroj: | Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 22:1892-1895 |
| ISSN: | 1520-8559 0734-2101 |
| DOI: | 10.1116/1.1766304 |
| Popis: | The use of polymeric aperture masks to fabricate high performance pentacene-based integrated circuits is presented. The aperture masks are fabricated using a laser ablation process with capabilities of generating 10 μm features. A mask set consisting of 4–6 aligned layers has been fabricated and has been used to demonstrate functional rf-powered integrated circuits with 20 μm gate lengths. Devices consisted of shadow-mask patterned layers of gold, alumina, and pentacene. TFT mobilities greater than 2 cm2/V s were measured and propagation delays from 7-stage ring oscillators of less than 5 μs were observed. This all-additive, dry patterning method has been extended to the production of samples as large as 6 in.×6 in. Larger aperture masks are under investigation and continuing efforts are focused on automation of the alignment process. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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