Study of RF plasma flow at low pressure: electron temperature influence

Autor:	A. Yu Shemakhin, E. Yu. Shemakhin, V. S. Zheltukhin, I. S. Pryalukin
Rok vydání:	2020
Předmět:	History Plasma flow Materials science Physics::Plasma Physics Analytical chemistry Electron temperature Computer Science Applications Education
Zdroj:	Journal of Physics: Conference Series. 1588:012062
ISSN:	1742-6596 1742-6588
DOI:	10.1088/1742-6596/1588/1/012062
Popis:	A mathematical model of low-pressure RF plasma flow taking into consideration electron temperature influence is presented. Results of calculations of carrier gas velocity, pressure and temperature as well as electron density and electron temperature in plasma flow are showed. Influence of electric field on electron temperature and plasma flow is analyzed.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::f1a128bc3f99cacd9b3fd3c27b055ccb https://doi.org/10.1088/1742-6596/1588/1/012062 Zobrazit plný text záznamu