Efficient optimization of high vacuum chemical vapor deposition of niobium oxide on full wafer scale

Autor:	S.A. Rushworth, E. Wagner, Giacomo Benvenuti, Patrik Hoffmann, Paul Muralt, Yury Kuzminykh, Scott Harada, S. C. Sandu, C. Parsons, Ali Dabirian
Rok vydání:	2010
Předmět:	Materials science Chemical engineering Hybrid physical-chemical vapor deposition Inorganic chemistry Ion plating Deposition (phase transition) Niobium oxide Chemical vapor deposition Combustion chemical vapor deposition Thin film Electron beam physical vapor deposition
Zdroj:	IOP Conference Series: Materials Science and Engineering. 8:012026
ISSN:	1757-899X
DOI:	10.1088/1757-899x/8/1/012026
Popis:	A systematic study of niobium oxide deposition using niobium tetraethoxy-dimethyl- amino-ethoxide (Nb(OEt)4(dmae)) precursor is presented. The deposition process was conducted in a high-vacuum chemical vapor deposition machine with precursor flux gradient capability. An efficient optimization of the deposition process was achieved and both mass-transport- and chemical-reaction-limited regimes were identified.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::f1931dd3bf80e83cb2fa7aa7e7bbff25 https://doi.org/10.1088/1757-899x/8/1/012026 Zobrazit plný text záznamu