A search for strain gradients in gold thin films on substrates using x-ray diffraction

Autor:	William D. Nix, Anneli Munkholm, Sean Brennan, O. S. Leung
Rok vydání:	2000
Předmět:	Diffraction Materials science Silicon General Physics and Astronomy chemistry.chemical_element Temperature cycling Grain size Crystallography chemistry Free surface X-ray crystallography Thin film Composite material Penetration depth
Zdroj:	Journal of Applied Physics. 88:1389-1396
ISSN:	1089-7550 0021-8979
Popis:	The high strengths of gold thin films on silicon substrates have been studied with particular reference to the possible effect of strain gradients. Wafer curvature/thermal cycling measurements have been used to study the strengths of unpassivated, oxide-free gold films ranging in thickness from 0.1 to 2.5 μm. Films thinner than about 1 μm in thickness appear to be weakened by diffusional relaxation effects near the free surface and are not good candidates for the study of strain gradient plasticity. Our search for plastically induced strain gradients was thus limited to thicker films with correspondingly larger grain sizes. Three related x-ray diffraction techniques have been used to investigate the elastic strains in these films. The standard dhkl vs sin2 Ψ technique has been used to find the average strain through the thickness of the films. The results are consistent with wafer curvature measurements. We have also measured a number of dhkl’s as a function of penetration depth to construct depth-depende...
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::f1806f10513367115a89dd3dccb78d35 https://doi.org/10.1063/1.373828 Zobrazit plný text záznamu