Summary Abstract: Polyimide etching and passivation downstream of an O2–CF4–Ar microwave plasma

Autor:	R. S. Horwath, V. Vukanovic, E. A. Matuszak, Frank D. Egitto, F. Emmi, Gerald A. Takacs
Rok vydání:	1986
Předmět:	Materials science Downstream (manufacturing) Passivation business.industry Etching (microfabrication) Polymer chemistry Optoelectronics Surfaces and Interfaces Condensed Matter Physics business Polyimide Ion source Surfaces Coatings and Films
Zdroj:	Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 4:698-699
ISSN:	1520-8559 0734-2101
DOI:	10.1116/1.573836
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::f176d3112b652ffa33ef4a96031ea8f9 https://doi.org/10.1116/1.573836 Zobrazit plný text záznamu