A novel approach for bulk micromachining of 4H-SiC by tool-based electrolytic plasma etching in HF-free aqueous solution
| Autor: | Shunda Zhan, Yonghua Zhao, Hongqiang Wang, Bangyan Dong |
|---|---|
| Rok vydání: | 2021 |
| Předmět: |
010302 applied physics
Microelectromechanical systems Bulk micromachining Silanes Materials science Aqueous solution Plasma etching 02 engineering and technology Electrolyte 021001 nanoscience & nanotechnology 01 natural sciences Evaporation (deposition) chemistry.chemical_compound chemistry Chemical engineering 0103 physical sciences Materials Chemistry Ceramics and Composites 0210 nano-technology Dissolution |
| Zdroj: | Journal of the European Ceramic Society. 41:5075-5087 |
| ISSN: | 0955-2219 |
| DOI: | 10.1016/j.jeurceramsoc.2021.04.012 |
| Popis: | Bulk micromachining of single-crystal SiC has been challenging due to its extreme stability both mechanically and chemically. To address this issue, a novel tool-based electrolytic plasma etching method is proposed, with which micropatterns and micro-holes are fabricated in SiC in a hydrofluoric acid-free aqueous solution with no need for masks. The material removal is the result of the combined effects of electrolytic plasma chemistry and physics. The chemistry refers to the reaction of Si with hydroxyl radical to form various SiOx and with H to form silanes, and the reactions of C to form volatile carbon oxides or hydrocarbons, all of which are accomplished and enhanced under the electrolytic plasma atmosphere. Besides, the local high temperature of plasma thermally promotes the evaporation or dissolution of SiO2 in NaOH solution. The tool-based electrolytic plasma etching method provides alternative approaches for the fabrication of SiC-based MEMS and devices. |
| Databáze: | OpenAIRE |
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