Effect of negative dc bias voltage on mechanical property ofa‐C:H films deposited in electron cyclotron resonance plasma

Autor:	Hidetoshi Saitoh, Tohru Inoue, Ken‐ichi Sugai, Kiichiro Kamata, Kazunori Maruyama
Rok vydání:	1995
Předmět:	Materials science Hydrogen Analytical chemistry General Physics and Astronomy chemistry.chemical_element Biasing Chemical vapor deposition Microstructure Electron cyclotron resonance Amorphous solid symbols.namesake chemistry Volume fraction symbols Raman spectroscopy
Zdroj:	Journal of Applied Physics. 78:1394-1396
ISSN:	1089-7550 0021-8979
DOI:	10.1063/1.360321
Popis:	Amorphous C:H films were deposited with CH4‐Ar‐H2 using a chemical vapor deposition apparatus assisted by electron cyclotron resonance plasma. The effects of applying negative dc bias voltage on the mechanical property and the microstructure of the films were examined. The microhardness of the films increased rapidly at a threshold value of the bias voltage at each gas ratio, [Ar]/([Ar]+[H2]). The results obtained from Raman spectroscopy suggest that the films contain diamondlike structure added to polymer structure over the threshold value on the negative dc bias voltage. Although the dc bias voltage required to form diamondlike carbon (DLC) becomes stronger with the increase in the H2 flow rate, the approximate volume fraction of DLC in the films rapidly increases, implying that hydrogen is more effective to synthesize DLC films.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::f1083e9f86f552a1e349802f77c7d1f2 https://doi.org/10.1063/1.360321 Zobrazit plný text záznamu