Computer modeling of oxygen migration in HgBa2CuO4+δ
Autor: | N. V. Moseev |
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Rok vydání: | 1999 |
Předmět: |
Materials science
Physics and Astronomy (miscellaneous) Condensed Matter::Other Molecular statics chemistry.chemical_element Oxygen Condensed Matter::Materials Science chemistry Chemical physics Vacancy defect Interstitial diffusion Physics::Atomic and Molecular Clusters Oxygen ions Astrophysics::Earth and Planetary Astrophysics Computer Science::Operating Systems |
Zdroj: | Technical Physics Letters. 25:591-592 |
ISSN: | 1090-6533 1063-7850 |
DOI: | 10.1134/1.1262565 |
Popis: | A molecular statics method is used to calculate the energy barriers for the migration of oxygen ions. Vacancy and interstitial diffusion mechanisms are considered. The lowest migration barrier is obtained for the vacancy mechanism. |
Databáze: | OpenAIRE |
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