Autor: |
J.E. Epler, M. Moser, Karlheinz H. Gulden, H.P. Schweizer |
Rok vydání: |
1997 |
Předmět: |
|
Zdroj: |
Journal of Crystal Growth. 170:404-407 |
ISSN: |
0022-0248 |
DOI: |
10.1016/s0022-0248(96)00517-9 |
Popis: |
Top-emitting Alas AlGaAs vertical cavity surface emitting lasers emitting at 765 nm with minimum threshold currents of 0.6 mA and threshold voltages of 1.9 V have been grown by MOVPE. In order to keep the growth time low, we investigated the possibility to grow these structures at growth rates of 5 μm/h. Special attention was paid to the homogeneity that can be achieved over a 2″ wafer under these growth conditions. Spatially resolved reflectivity measurements on GaAs AlAs distributed Bragg reflectors showed, that the growth rate varies less than 0.3% in the center of the wafer and decreases by 1% at the wafer edge. |
Databáze: |
OpenAIRE |
Externí odkaz: |
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