Autor:	Robert Clayton Wheland, Barbara Bobik Fones, Hoang Tran, Mureo Kaku, Luke W. Brubaker, Douglas J. Adelman, John J. Schmieg, Roger H. French, Jerald Feldman, M. F. Lemon, Michael T. Mocella, Weiming Qiu, Min K. Yang, Brian E. Fischel, Osami Nagao
Rok vydání:	2007
Předmět:	Absorbance Particle contamination Materials science Polymers and Plastics Organic Chemistry Metallurgy Materials Chemistry Analytical chemistry Leaching (metallurgy) Fluid handling Refractive index Immersion lithography
Zdroj:	Journal of Photopolymer Science and Technology. 20:729-738
ISSN:	1349-6336 0914-9244
DOI:	10.2494/photopolymer.20.729
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::f0a59acc924b4a20e72f1b6fdc971ec7 https://doi.org/10.2494/photopolymer.20.729 Zobrazit plný text záznamu