| Autor: |
Mehrban Jam, Ohseung Kwon, Albert Jeans, Dan Stieler, Jason Hauschildt, Robert A. Garcia, Craig Perlov, Robert L. Cobene, Ping Mei, Mark T. Smith, Fernando Gomez-Pancorbo, Marcia Almanza-Workman, Steve Braymen, Carl Taussig, Frank Jeffrey, John Maltabes, Hao Luo, Han-Jun Kim, Richard E. Elder, Warren B. Jackson, Kelly Junge, Don Larson |
| Rok vydání: |
2010 |
| Předmět: |
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| Zdroj: |
SPIE Proceedings. |
| ISSN: |
0277-786X |
| DOI: |
10.1117/12.852268 |
| Popis: |
A solution to the problems of roll-to-roll lithography on flexible substrates is presented. We have developed a roll-toroll imprint lithography technique to fabricate active matrix transistor backplanes on flexible webs of polyimide that have a blanket material stack of metals, dielectrics, and semiconductors. Imprint lithography produces a multi-level 3- dimensional mask that is then successively etched to pattern the underlying layers into the desired structures. This process, Self-Aligned Imprint Lithography (SAIL), solves the layer-to-layer alignment problem because all masking levels are created with one imprint step. The processes and equipment required for complete roll-to-roll SAIL fabrication will be described. Emphasis will be placed on the advances in the roll-to-roll imprint process which have enabled us to produce working transistor arrays. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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