Effect of implantation of active metal ions on the elemental and chemical compositions of the CdTe surface

Autor:	Z. E. Mukhtarov, Z. A. Isakhanov, T. Kodirov, E. S. Ergashev, B. E. Umirzakov
Rok vydání:	2015
Předmět:	Materials science Ion implantation Physics and Astronomy (miscellaneous) Annealing (metallurgy) Metal ions in aqueous solution Analytical chemistry Electron Atomic physics Cadmium telluride photovoltaics Ion
Zdroj:	Technical Physics. 60:1880-1883
ISSN:	1090-6525 1063-7842
DOI:	10.1134/s1063784215120130
Popis:	We study the effect of bombardment with Ar+ and Ba+ ions on the composition and electron structure of the CdTe film surface. The optimal ion implantation and annealing regimes for obtaining a nanofilm of the Cd0.5Ba0.5Te type are determined. It is found that the value of Eg of the three-component film decreases from 1.9 to 1.7 eV upon an increase in its thickness from 20 to 40 nm.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::f0117fd9155cec953efc22fb1b85ff23 https://doi.org/10.1134/s1063784215120130 Zobrazit plný text záznamu Plný text ve formátu PDF