Novel antireflection method with gradient photoabsorption for optical lithography

Autor: Shou-ichi Uchino, Toshihiko P. Tanaka, Naoko Asai
Rok vydání: 1996
Předmět:
Zdroj: SPIE Proceedings.
ISSN: 0277-786X
DOI: 10.1117/12.240926
Popis: A new concept using the bottom antireflection layer with graded photoabsorption named GALA (gradient absorption layer) is described to resolve the problems with conventional antireflection methods, such as insufficient antireflection, substrate material, and structure dependence. The antireflection layer with high photoabsorption at the bottom eliminates the light reflected from the substrate and the graded photoabsorption suppresses the surface reflection of the layer. This new method can achieve extremely low reflection (less than 3 percent) for all substrates.
Databáze: OpenAIRE