Line Growth on the H/Si(100)-2 × 1 Surface: Density Functional Study of Allylic Mercaptan Reaction Mechanisms
| Autor: | Krishnan Raghavachari, Glen Allen Ferguson, Christopher Trong Linh Than |
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| Rok vydání: | 2009 |
| Předmět: |
Surface (mathematics)
Allylic rearrangement Reaction mechanism business.industry Chemistry Photochemistry Surfaces Coatings and Films Electronic Optical and Magnetic Materials General Energy Computational chemistry Microelectronics Molecule Physical and Theoretical Chemistry business Line (formation) |
| Zdroj: | The Journal of Physical Chemistry C. 113:18817-18822 |
| ISSN: | 1932-7455 1932-7447 |
| Popis: | The growth of molecular lines on the Si(100)-2 × 1 surface is an area of intense interest due to its possible application to the microelectronics industry. While many molecules have been found to g... |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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