| Autor: |
Psnsr Srikar, R. K. Gangwar, S. M. Maliyekkal, S. M. Allabakshi |
| Rok vydání: |
2021 |
| Předmět: |
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| Zdroj: |
2021 IEEE International Conference on Plasma Science (ICOPS). |
| Popis: |
Advanced oxidation process (AOP) is an emerging technology for removing complex organic molecules in water and wastewater treatment and surface disinfection. AOPs rely on the in-situ generation of reactive chemical species (RCS) such as hydroxyl radicals to degrade the pollutants. However, most of the RCS responsible for oxidizing the contaminants are short-lived, and hence their production in-situ is warranted for practical application. The plasm-mediated AOP is an emerging technology and superior to other conventional AOPs due to its high ability to generate RCS at a controlled rate. Controlling the operating conditions of the plasma system can tune the production of RCS easily which is crucial for developing the next generation plasma reactors. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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