Relationship between Oxygen Additive Amount and Photoresist Removal Rate Using H Radicals Generated on an Iridium Hot-Wire Catalyst

Autor:	Shiro Nagaoka, Masashi Yamamoto, Hironobu Umemoto, Tomokazu Shikama, Hideo Horibe, Tomohiro Shiroi
Rok vydání:	2019
Předmět:	Materials science Polymers and Plastics chemistry Radical Organic Chemistry Inorganic chemistry Materials Chemistry chemistry.chemical_element Iridium Photoresist Oxygen Catalysis
Zdroj:	Journal of Photopolymer Science and Technology. 32:609-614
ISSN:	1349-6336 0914-9244
DOI:	10.2494/photopolymer.32.609
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::efc812e56416785612b70bc4acff0406 https://doi.org/10.2494/photopolymer.32.609 Zobrazit plný text záznamu