DEPOSITION OF HARD SILICON CARBONITRIDE COATINGS FROM HEXAMETHYLDISILAZANE (HMDS) AND HMDS+BENZENE VAPORS IN LASER PLASMA
| Autor: | V. N. Demin, V. O. Borisov, Tamara P. Smirnova, G. N. Grachev, M. N. Khomyakov, A. L. Smirnov |
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| Rok vydání: | 2020 |
| Předmět: |
Materials science
Silicon Analytical chemistry chemistry.chemical_element Laser Indentation hardness law.invention Amorphous solid Inorganic Chemistry chemistry.chemical_compound symbols.namesake chemistry law Transmission electron microscopy Materials Chemistry symbols Physical and Theoretical Chemistry Benzene Raman spectroscopy Deposition (law) |
| Zdroj: | Journal of Structural Chemistry. 61:1390-1397 |
| ISSN: | 1573-8779 0022-4766 |
| Popis: | Hard silicon carbonitride coatings are prepared using Ar and Ar (10 vol.% He) laser plasma from hexamethyldisilazane (HMDS) [(CH3)3Si]2NH and HMDS+benzene vapors. The coatings are characterized by infrared (IR), Raman, and X-ray photoelectron spectroscopies, transmission electron microscopy, and atomic force microscopy. The obtained coatings are amorphous and uniform in composition and over the film thickness. The microhardness of coatings synthesized on steel from a HMDS+ benzene mixture increases from 12 GPa to 18 GPa provided that other parameters remain constant. |
| Databáze: | OpenAIRE |
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