Magnetic field profile dependence of zirconium flux in sputtering ion sources
| Autor: | T. Suzuki, Y. Fujii, T. Saburi, N. Kitayama, Y. Kawai |
|---|---|
| Rok vydání: | 2000 |
| Předmět: |
Zirconium
Materials science Physics::Instrumentation and Detectors chemistry.chemical_element Ion current Fourier transform ion cyclotron resonance Electron cyclotron resonance Ion source Secondary ion mass spectrometry chemistry Physics::Plasma Physics Sputtering Physics::Accelerator Physics Physics::Chemical Physics Atomic physics Instrumentation Ion cyclotron resonance |
| Zdroj: | Review of Scientific Instruments. 71:735-737 |
| ISSN: | 1089-7623 0034-6748 |
| DOI: | 10.1063/1.1150278 |
| Popis: | A zirconium sputtering ion source was studied. The argon plasma discharged by electron cyclotron resonance was used as the sputtering working plasma. A cylindrical-type target was used as the sputter target. The zirconium flux is evaluated at the downstream side of the ion source by varying the magnetic field profile of the ion source. And a magnetic profile dependence of the zirconium flux was observed. Zirconium ions and argon ions were detected by a quadrupole mass spectrometer. From the zirconium flux and the ion current, the ionization efficiency was evaluated. |
| Databáze: | OpenAIRE |
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