Structure and growth of ultrathin titanium oxide films on Ru(0001)
Autor: | Harry E. Hoster, D. Rosenthal, A. Männig, Z. Zhao, Klaus Christmann, Hubert Rauscher, Rolf Jürgen Behm |
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Rok vydání: | 2005 |
Předmět: |
Auger electron spectroscopy
Materials science Annealing (metallurgy) Analytical chemistry Surfaces and Interfaces Condensed Matter Physics Epitaxy Surfaces Coatings and Films Titanium oxide law.invention X-ray photoelectron spectroscopy law Monolayer Materials Chemistry Thermal stability Scanning tunneling microscope |
Zdroj: | Surface Science. 576:29-44 |
ISSN: | 0039-6028 |
DOI: | 10.1016/j.susc.2004.11.039 |
Popis: | Structure, chemical composition and thermal stability of TiO x films with a thickness of up to 3 ML grown on a Ru(0 0 0 1) substrate were investigated by scanning tunneling microscopy, X-ray photoelectron spectroscopy and Auger electron spectroscopy. The films were prepared by evaporation of Ti in 10 −7 mbar O 2 onto Ru(0 0 0 1) at 640 K, followed by annealing in 10 −7 mbar O 2 or in UHV at temperatures between 700 K and 1000 K. Depending on the deposition and post-annealing conditions, we find several different structures of the Ti oxide, with the layers post-annealed in an O 2 environment being generally better defined than those post-annealed in vacuum. The layers consist of triangular units which coalesce upon annealing. O 2 annealing of monolayer films leads to an oxygen deficient TiO 2 layer. Annealing to 900–1000 K changes the structure and composition of the film, a coincidence structure with a Moire pattern is observed upon O 2 annealing. |
Databáze: | OpenAIRE |
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