Lithography error budget

Autor:	Gilbert V. Shelden, John Canning
Rok vydání:	1994
Předmět:	Engineering Engineering drawing business.industry media_common.quotation_subject Emphasis (telecommunications) Process (computing) Overlay Reliability engineering Megabit Photomask Function (engineering) business Lithography Critical dimension media_common
Zdroj:	64-to 256-Megabit Reticle Generation: Technology Requirements and Approaches: A Critical Review.
ISSN:	0277-786X
DOI:	10.1117/12.177437
Popis:	As design rules shrink to meet the needs of advanced chips, the allocation of allowable errors between sources gets ever more critical. This paper will examine the error sources and budgets for current technologies and project the requirements for future 64 and 256 megabit generations. The emphasis will be on overlay and critical dimension as a function of design rule generation for the photomask, the photolithographic process and the etching process.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::ef76c84fc5ba568d967dde440babe7ac https://doi.org/10.1117/12.177437 Zobrazit plný text záznamu