Characterization of oxidized gallium droplets on silicon surface: An ellipsoidal droplet shape model for angle resolved X-ray photoelectron spectroscopy analysis
| Autor: | Josef Polčák, O. Tomanec, Miroslav Kolíbal, Tomáš Šikola, Jan Čechal, Tomáš Matlocha, Petr Dub, Radek Kalousek |
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| Rok vydání: | 2009 |
| Předmět: |
Silicon
Binding energy Metals and Alloys Oxide Analytical chemistry chemistry.chemical_element Surfaces and Interfaces Photoelectric effect Surfaces Coatings and Films Electronic Optical and Magnetic Materials Characterization (materials science) Physics::Fluid Dynamics chemistry.chemical_compound X-ray photoelectron spectroscopy chemistry Physics::Atomic and Molecular Clusters Materials Chemistry Deposition (phase transition) Gallium |
| Zdroj: | Thin Solid Films. 517:1928-1934 |
| ISSN: | 0040-6090 |
| Popis: | Deposition and oxidation of metallic gallium droplets on Si(111) were studied by angle resolved X-ray photoelectron spectroscopy. Two gallium peaks – Ga 3d and Ga 2p – were simultaneously measured in order to get an advantage of different inelastic mean free paths of photoelectrons from these two energy levels differing in binding energy by 1100 eV. Together with the angular dependent data it enhances the precision of the size characterization of Ga droplets and oxide thickness determination. A model for the calculation of theoretical intensities based on an ellipsoidal shape of droplets is presented and a simple procedure for estimation of droplet height and actual surface coverage based on measurement on a single emission angle is suggested. |
| Databáze: | OpenAIRE |
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