An electron‐beam controlled diffuse discharge switch

Autor:	Karl H. Schoenbach, H. C. Harjes, H.G. Krompholz, D. Skaggs, M. Kristiansen, G. Schaefer
Rok vydání:	1985
Předmět:	Range (particle radiation) Chemistry Buffer gas Monte Carlo method Analytical chemistry General Physics and Astronomy Field strength Rate equation Cathode Anode law.invention Physics::Plasma Physics law Cathode ray Atomic physics
Zdroj:	Journal of Applied Physics. 57:1618-1622
ISSN:	1089-7550 0021-8979
DOI:	10.1063/1.334481
Popis:	The performance of externally controlled, high‐pressure, diffuse discharges as switching elements in pulse power systems is strongly determined by the recombination and attachment processes in the fill gas. To obtain high control efficiency and fast response of the diffuse discharge switch the discharge must be attachment dominated with the attachment rate coefficient increasing with field strength. An electron‐beam controlled diffuse discharge system was constructed to study the behavior of pulsed discharges in the submicrosecond range in gas mixtures containing N2 as a buffer gas and small additives of electronegative gases. The results of experiments in N2 plus N2O were compared with values obtained with a Monte Carlo code and a rate equation calculation.
Databáze:	OpenAIRE
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