(Invited) Innovative Deposition Technology for Advanced Materials

Autor:	P. Lehnen, Ziaul Karim, Johannes Lindner, Brian Lu, Yoshi Senzaki, Bernd Schineller, Peter K. Baumann, U. Weber, Michael Heuken
Rok vydání:	2010
Předmět:	Materials science Nanotechnology Advanced materials Deposition (chemistry)
Zdroj:	ECS Transactions. 28:137-144
ISSN:	1938-6737 1938-5862
Popis:	Multi component films for a range of device applications were deposited by atomic vapor deposition (AVD®). Dysprosium doped HfO2 was studied as a high-k material. All HfDyOx films showed a tegragonal/cubic phase. A Dy concentration of 4% was determined for an optimum increase of the k-value. The material GeSbTe was investigated as a possible candidate for phase change applications. The material was deposited in a wide range of compositions in a controlled fashion. In particular the Ge2Sb2Te5 phase was achieved with good composition, thickness and electrical resistivity uniformity. Gap fill and phase change properties were studied.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::eed78f64a4221bb166714474909d8791 https://doi.org/10.1149/1.3375596 Zobrazit plný text záznamu