Single-crystal silicon micromirror array with polysilicon flexures
| Autor: | Greg A. Kirkos, Ajaj Pareek, Mirela Gabriela Bancu, Tristan Shone, Chuan Che Wang, T.D. Kudrle, Clifford D. Fung, M. Waelti, Carlos H. Mastrangelo, James C. Hsiao |
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| Rok vydání: | 2005 |
| Předmět: |
Materials science
business.industry Metals and Alloys Gimbal Condensed Matter Physics Computer Science::Other Surfaces Coatings and Films Electronic Optical and Magnetic Materials Radius of curvature (optics) Surface micromachining Optics Orthogonal coordinates Electrode Wafer Electrical and Electronic Engineering business Instrumentation Polyimide Voltage |
| Zdroj: | Sensors and Actuators A: Physical. 119:559-566 |
| ISSN: | 0924-4247 |
| DOI: | 10.1016/j.sna.2004.10.038 |
| Popis: | High-density micromirror arrays (1296 mirrors) have been fabricated with a process that combines the benefits of both bulk and surface micromachining. Arrays fabricated with this technique are characterized by optically flat mirrors characterized by radius of curvature (ROC) ∼1 m, spring constant uniformity (∼6%) across the array, and yields greater than 90%. Each array element consists of a mirror-in-gimbal structure that allows the mirror to rotate about two orthogonal axes when voltage is applied to electrodes beneath the mirror. A dry release process combined with through wafer etching and spin-cast polyimide is introduced as a simple, effective alternative to critical point drying for releasing the structures. Tilt angle measurements for these devices show stable angular range of ±5° (mechanical) at 160–170 V. |
| Databáze: | OpenAIRE |
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