Microstructure of Porous Silicon Thin Films

Autor:	Rosario A. Gerhardt, Y. Berta
Rok vydání:	1998
Předmět:	Materials science Thin film Composite material Porous silicon Microstructure Instrumentation
Zdroj:	Microscopy and Microanalysis. 4:632-633
ISSN:	1435-8115 1431-9276
DOI:	10.1017/s143192760002328x
Popis:	Porous silicon has potential applications in the microelectronics industry. It has been investigated as an electroluminescent source1, as a sensing device in chemical sensors and as an antireflective coating for solar cells. The low efficiency of the solar cells is enhanced by the antireflective coating that porous silicon provides, while the cost of fabrication of the cells is decreased. Porous silicon is normally processed by electrochemical anodization of silicon wafers. Since parameters such as current density, anodization time, and surface conditions can affect the microstructure of the films obtained, we varied the current density to study the effect of the microstructure on the resultant reflectance for the purpose of improving it. It has been found that higher current densities result in higher reflectance films than the lower current densities.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::ee953d4f23ce0041ea8f4fb54a073335 https://doi.org/10.1017/s143192760002328x Zobrazit plný text záznamu