Photoinduced acid-catalyzed silicon dioxide formation at the polymer surface by chemical vapor deposition

Autor:	Masahiro Tsunooka, Masakatsu Hayashi, Masamitsu Shirai
Rok vydání:	1992
Předmět:	chemistry.chemical_classification Polymers and Plastics Silicon dioxide Organic Chemistry Inorganic chemistry Polymer Chemical vapor deposition Photochemistry Inorganic Chemistry chemistry.chemical_compound Acid catalysis chemistry Materials Chemistry Copolymer Orthosilicate Irradiation Isopropyl
Zdroj:	Macromolecules. 25:195-200
ISSN:	1520-5835 0024-9297
DOI:	10.1021/ma00027a033
Popis:	Copolymers of 1,2,3,4-tetrahydro-1-naphtylideneamino-p-styrenesulfonate (NISS) and methyl, isopropyl or benzyl methacrylate were prepared by photoinitiated radical copolymerization. Since the NISS units of the polymers can form p-styrenesulfonic acid on UV irradiation, the irradiated polymers sorbed water from the atmosphere. The water sorption was studied. When the irradiated polymer films were exposed to the vapor of tetraalkyl orthosilicate, methyltrimethylsiloxane or methyltriethoxysilane, SiO 2 was formed at the near surface of the irradiated polymers
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::ee55417ec8813d643748de2755fa6ac0 https://doi.org/10.1021/ma00027a033 Zobrazit plný text záznamu