Bulk silicon micromachining using porous silicon sacrificial layers
| Autor: | Grigoris Kaltsas, A. G. Nassiopoulos |
|---|---|
| Rok vydání: | 1997 |
| Předmět: |
Bulk micromachining
Fabrication Materials science Silicon Hybrid silicon laser chemistry.chemical_element Nanotechnology Condensed Matter Physics Porous silicon Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Monocrystalline silicon Surface micromachining chemistry LOCOS Electrical and Electronic Engineering |
| Zdroj: | Microelectronic Engineering. 35:397-400 |
| ISSN: | 0167-9317 |
| DOI: | 10.1016/s0167-9317(96)00209-2 |
| Popis: | A bulk silicon micromachining technique using porous silicon as a sacrificial layer is developed. The proposed process is fully C-MOS compatible and it was successfully used to fabricate deep cavities into silicon with very smooth bottom surfaces and sidewalls. Suspended flat polysilicon membranes were also produced of a surface as large as 230 × 550 μm2, as well as polysilicon cantilevers. This process opens important possibilities in silicon integrated sensor fabrication. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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