Processing and characterization of alumina thin films on chemically vapor deposited diamond substrates for producing adherent metallizations
| Autor: | E. S. K. Menon, I. Dutta |
|---|---|
| Rok vydání: | 1999 |
| Předmět: |
Auger electron spectroscopy
Materials science Mechanical Engineering Oxide Diamond Combustion chemical vapor deposition engineering.material Condensed Matter Physics Microstructure chemistry.chemical_compound Carbon film Chemical engineering chemistry Mechanics of Materials Transmission electron microscopy engineering General Materials Science Thin film |
| Zdroj: | Journal of Materials Research. 14:565-577 |
| ISSN: | 2044-5326 0884-2914 |
| DOI: | 10.1557/jmr.1999.0081 |
| Popis: | In order to make the surface of chemically vapor deposited diamond (CVDD) substrates amenable to metallization by both thin and thick film approaches currently utilized in electronic packaging, a thin, adherent, insulating aluminum oxide film was grown on diamond at low temperatures (23C6 formation, while the bonding between the Cr and alumina layers was provided by the formation of a compositionally modulated solid solution with Al2O3-rich and Cr2O3-rich regions. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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