Enhanced Metal-Assisted Chemical Etching of Silicon Nanopores via Localized Surface Plasmon Resonance

Autor:	Te-Chang Chen, Ming-Chang M. Lee, Ta-Jen Yen, Ming-Hung Lai
Rok vydání:	2014
Předmět:	Materials science Silicon business.industry Surface plasmon chemistry.chemical_element Isotropic etching Metal Nanopore chemistry visual_art visual_art.visual_art_medium Optoelectronics General Materials Science Surface plasmon resonance business Localized surface plasmon
Zdroj:	Nanoscience and Nanotechnology Letters. 6:477-480
ISSN:	1941-4919 1941-4900
DOI:	10.1166/nnl.2014.1791
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::edc87002687b29f4fc15f450f7aaa177 https://doi.org/10.1166/nnl.2014.1791 Zobrazit plný text záznamu