Three-dimensional photolithography using built-in lens mask
| Autor: | Masaru Sasago, Hisao Kikuta, Hiroaki Kawata, Toshiki Tanaka, Daiki Sugihara, Yoshihiko Hirai |
|---|---|
| Rok vydání: | 2017 |
| Předmět: |
Materials science
Physics::Optics 02 engineering and technology 01 natural sciences law.invention 010309 optics Optics Mask set law 0103 physical sciences Materials Chemistry Electrical and Electronic Engineering Instrumentation Lithography Microelectromechanical systems business.industry Process Chemistry and Technology 021001 nanoscience & nanotechnology Surfaces Coatings and Films Electronic Optical and Magnetic Materials Lens (optics) Cardinal point Resist Phase-shift mask Photolithography 0210 nano-technology business |
| Zdroj: | Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 35:06G308 |
| ISSN: | 2166-2754 2166-2746 |
| DOI: | 10.1116/1.4995693 |
| Popis: | Three-dimensional lithography processes are required to fabricate the complex structures of advanced MEMS devices. The built-in lens mask has a complex transmittance amplitude and emulates the optical wave planes of arbitrarily shaped images that are to be focused on a focal plane. In our previous work, the authors proposed a novel three-dimensional imaging method using a multifocusing built-in lens mask in a computational simulation study. In this work, the authors study the three-dimensional photolithography process experimentally using this built-in lens mask. A pyramidal frame pattern is used to expose a negative thick resist layer (SU-8), and three-dimensional structures are successfully obtained using a single mask and a single-shot photolithography process. The experimental results agree fairly well with those from the computational simulations. |
| Databáze: | OpenAIRE |
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