Efficient Tunnel Junction Lithographic Aperture 940 nm VCSEL

Autor:	Antoine Pissis, Eimantas Duda, Stefano Tirelli, Urs Siegenthaler, David Quandt, Donato Bonfrate, Pratyush Das Kanungo, Martin Spieser, Evgeny Zibik
Rok vydání:	2023
Předmět:	Electrical and Electronic Engineering Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials
Zdroj:	IEEE Photonics Technology Letters. 35:389-392
ISSN:	1941-0174 1041-1135
DOI:	10.1109/lpt.2023.3244588
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::ece849ff0b5f69ba32c2b1b8b73c10ec https://doi.org/10.1109/lpt.2023.3244588 Zobrazit plný text záznamu