| Autor: |
A. V. Iisenko, D. M. Nikulin |
| Rok vydání: |
2022 |
| Předmět: |
|
| Zdroj: |
Interexpo GEO-Siberia. 6:134-142 |
| ISSN: |
2618-981X |
| DOI: |
10.33764/2618-981x-2022-6-134-143 |
| Popis: |
The production of photomasks is one of the most complex processes in microelectronics. The precision of manufacturing the elements of the photomask depends on the accuracy of manufacturing the chips. The article proposes a technique for controlling defects, compatibility and measuring the size of elements of photomasks based on digital image processing using software products. The design of an experimental installation for quality control and accuracy of photomasks using optical and optoelectronic devices is given. The optical characteristics of the proposed installation are calculated: field of view and resolution. Experimental results of the control of defects of photomasks on it according to three technological parameters are presented: the search for defects, the control of the geometric dimensions of elements and the combination. Experimental results show the possibility of using such installations for defect control and evaluation of the topology characteristics of photomasks. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
|
